630-mm Large-aperture Phase-Shifting Interferometer

JKYOptics400R is intended for deposition of precision optical coatings with high stability and mechanical strength in medium scale production of a wide range products.

JKYOptics400R implements advanced magnetron sputtering technology with high-density plasma oxidation. The technology allows making deposition of films with high optical characteristics, smooth borders, low mechanical stresses, and with high accuracy and thickness uniformity of the layers. Additionally, the equipment provides opportunities for research and development of new technologies and optical materials through the joint application of two different materials.

JKYOptics400R provides high production performance of small batches of products of a wide range as well as in the development of new coatings due to the short manufacturing cycle and stability of the optical characteristics of the layer materials and the rate of their deposition.

JKYOptics400R implements advanced magnetron sputtering technology with high-density plasma oxidation. During the processing, substrates fixed on the fast-rotating drum-shaped holder pass a deposition zone receiving a very thin layer of metal (or other material sputtered by a magnetron) and then the oxidation zone where this thin layer is completely oxidized by high-density oxygen plasma. In this way, a very thin layer of high-quality oxide is formed on each turn of the drum. The required thickness of each layer of an optical structure is obtained by a number of such revolutions. Rotating magnetron targets are used to provide high material capacity, and very stable and efficient technological process.

JKYOptics400R provides simplicity, stability and high throughput for high-quality precision optical coatings. The compact geometry and directional deposition provide more economical transfer of atoms from the sputtering target directly to the substrates. This achieves effective use of the material, increases the period of interoperative maintenance of in-chamber shields, and reduces the total cost and time spent on final products. The loadlock chamber allows for up to 40% more economical use of energy resources and a 25% reduction in operating time for manufacturing test batches of products in comparison with classic electron beam or resistive thermal evaporation. The use of a magazine of substrate-holder drums in the loadlock chamber allows, without the participation of an operator and without changing the deposition conditions inside technological chamber, to obtain batches of optical coatings that differ in the structure of the layers

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